Smartphone users can now expect much more precise and clearer pictures from hard light surroundings.
To shoot high-quality photos, CMOS image detectors will need to maintain just as much light, or photons, as possible and transmit the ideal color info into the photodiode.
Such requirements were solved by the introduction of Samsung’s ISOCELL engineering in 2013. ISOCELL creates a physical barrier between the neighboring pixels, decreasing colour crosstalk and enlarging the full-well capacity. This empowers each pixel to absorb and hold much more mild compared to the standard backside-illuminated (BSI) image detector design for superior picture quality.
With the debut of ISOCELL Plus, Samsung pushes pixel isolation technologies to another level via an optimized pixel design. In the present pixel arrangement, metal grids are shaped within the photodiodes to decrease interference between the pixels, which could also result in some optical reduction as metals have a tendency to signify and/or absorb the incoming light.
For ISOCELL Plus, Samsung altered the metallic barrier using a new new material created by Fujifilm, minimizing optical reduction and mild reflection.
The brand new ISOCELL Plus provides higher colour fidelity and up to some 15-percent improvement in light sensitivity. The technology also empowers image detectors to equip 0.8-micrometer (µm) along with smaller-sized pixels with no reduction in functionality, which makes it an ideal solution for developing super-resolution cameras using more than 20 megapixels.
“Through close cooperation with Fujifilm, a business leader in imaging and information technologies, we’ve pushed the bounds of CMOS image sensor technologies even farther,” explained Ben K. Hur, vice president of System LSI marketing at Samsung Electronics. “The ISOCELL Plus won’t just permit the progression of ultra-high-resolution detectors with incredibly compact pixel dimensions but also bring functionality advancements for detectors with pixel layouts.”